Production of high-transparent MgO films by radio-frequency sputtering method

Fabrication of high-quality single-crystal Cu thin films using radio-frequency sputtering

Copper (Cu) thin films have been widely used as electrodes and interconnection wires in integrated electronic circuits, and more recently as substrates for the synthesis of graphene. However, the ultra-high vacuum processes required for high-quality Cu film fabrication, such as molecular beam epitaxy (MBE), restricts mass production with low cost. In this work, we demonstrated high-quality Cu t...

Resistance switching in transparent magnetic MgO films

We have studied the abrupt and hysteretic changes of resistance in MgObased capacitor devices. The switching behavior is discussed in terms of the formation and rupture of conduction filaments due to the migration of structural defects in the electric field, together with the redox events which affects the mobile carriers. The results presented in this paper suggest that MgO transparent films c...

Characteristics of ZnO thin films prepared by radio frequency magnetron sputtering

We investigated in this study structural and nanomechanical properties of zinc oxide (ZnO) thin films deposited onto Langasite substrates at 200 C through radio frequency magnetron sputtering with an radio frequency power at 200 W in an O2/Ar gas mixture for different deposition time at 1, 2, and 3 h. Surface morphologies and crystalline structural characteristics were examined using X-ray diff...

Deposition by radio frequency magnetron sputtering of GaV4S8 thin films for resistive random access memory application

Reduced surface roughness of solid thin films prepared by alternating-bias, radio-frequency magnetron sputtering

Surface roughness that is associated with thin-film deposition has a direct effect on the optical, electrical, and mechanical quality of solid-thin-film devices. The effect of using alternating bias during rf-magnetron sputtering of SiO2 on Si substrate was investigated, and it was proven experimentally that modulating the plasma flow by means of alternating bias produces more even deposition o...